ProductsProducts
Wafer Cleaning System / Wet Station
WS-620C/
WS-820C/
WS-820L
Wafer size 150mm ~ 200mm
High Throughput Batch Cleaning Systems Enable Flexible Line Configurations
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1. Two Transfer Types
Choose either the WS-620C for 150 mm wafers or WS-820C for 200 mm wafers with carrier transfer processing, or the WS-820L for 200 mm wafers with carrierless transfer processing.
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2. Flexible Design
Systems can be configured freely, depending on the application. Processing bath configurations can incorporate up to 13 baths.
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3. High Throughput
Multiple baths can be installed and up to six transfer robots can be mounted to ensure high throughput.
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4. High-quality Processing
Optimized processing bath design, strict chemical management, and clean drying units contribute to stable, high-quality processing.
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5. Extensive Lineup of Peripheral Devices
A wide range of peripheral devices are available, including wafer transfer units and cassette stockers.
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6. Prevention of Watermarks
A low-pressure drying unit can be mounted to reduce watermarks and ensure clean drying. (Available only for WS-820L)
SD : Spin Dryer / EDR : Dump Rinsing bath
