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Spectroscopic Film Thickness Measurement System
VM-1020
Wafer size 50mm ~ 300mm
Microscope model that is ideal for R&D
Features
- Each unit is composed of a microscope section and spectrometer section, which incorporate an objective lens unit, manual XY stage, electric revolver, objective lens, filter insert section, and light source. A fiber optic input type CCD spectrometer has been adopted, enabling the reflected light from the sample surface to be simultaneously measured across all wavelengths in the visible light range. This provides high-speed, high-precision measurement of film thicknesses.
- The system's simultaneous full-wavelength photometry and high-performance CPU provide high-speed computation, with immediate display of film thickness values.
- Use of the recipe wizard function greatly simplifies the complicated process of recipe creation. Both the registration and management of recipes have also been significantly improved
測定機能
● Measurement of 25-type layered film (UV model: 29 type)
● Measurement of spectral reflectance
● User registration of film types
● Three-dimensional mapping of measured data and other statistical outputs
● Simultaneous measurement of layered film (up to four layers)
● Calculation of the etch rate
Other
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Ellipsometric Film Thickness Measurement System
RE-3500
Wafer size 125mm ~ 300mm
Measurement Equipment to Support Electronic Devices for loT.
-
Spectroscopic Film Thickness Measurement System
VM-2500/
VM-3500Wafer size 100mm ~ 300mm
High-speed mode achieves a high throughput of 160 WPH, optimal for multipoint measurement of communications devices and other products.
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Spectroscopic Film Thickness Measurement System
VM-1200/
VM-1300Wafer size 100mm ~ 300mm
A desktop model that can be incorporated into production lines