Spin Scrubber
Wafer size 100mm ~ 200mm
Advanced Scrubber Featuring the Same Stability and Reliability as the Highly Regarded SS Series.
Wet Station
Wafer size 50mm ~ 200mm
Half the Footprint, 1.5 Times the Productivity! Excellent Cost-Performance!
Wafer size 150mm ~ 200mm
High Throughput Batch Cleaning Systems Enable Flexible Line Configurations
Wafer size 200mm
Compact Half-pitch and One-bath Batch Cleaning System
Spin Processor
Inherits High-end Single Wafer Cleaning Technology to Deliver Outstanding Cost Performance
Wafer size 76mm ~ 200mm
Outstanding functionality and scalability easily handle emerging needs
Coat/Develop Track
Flexibility to Process a Variety of Substrates
Spray Coater
Flexible, Optimized Coating of MEMS with 3D Structures
Ellipsometric Film Thickness Measurement System
Wafer size 125mm ~ 300mm
Measurement Equipment to Support Electronic Devices for loT.
Spectroscopic Film Thickness Measurement System
Wafer size 100mm ~ 300mm
High-speed mode achieves a high throughput of 160 WPH, optimal for multipoint measurement of communications devices and other products.
A desktop model that can be incorporated into production lines
Wafer size 50mm ~ 300mm
Microscope model that is ideal for R&D
Wafer Pattern Inspection System
Flagship Model Featuring High-resolution Inspection of Wafers up to 300mm
High-speed, Superior cost performance.